Photo electron Soul Inc. will give a talk at the 69th Symposium of the Japanese Society of Microscopy, to be held in Kumamoto, Japan.
In this talk, we will introduce our proprietary dynamic electron beam control technologies—based on GaN photocathodes—and their applications in semiconductor SEM analysis. We will discuss new perspectives that electron microscopy analysis brings to advanced semiconductor manufacturing, an area characterized by increasing structural complexity and device scaling.
■ Symposium Information
•Symposium: The 69th Symposium of the Japanese Society of Microscopy (Official event page in Japanese)
•Theme: Microscopy Opening New Frontiers in Semiconductor Innovation and Life Sciences
•Dates: November 6 (Fri) – November 7 (Sat), 2026
•Venue: Kumamoto-jo Hall (Kumamoto, Japan.)
■ Presentation Information
•Date: November 6, 2026 (Fri) 13:00-15:00 (Symposium S-3) (Official event page in Japanese)
•Session: (S-3) Current Trends and New Developments in Semiconductor Analysis Methods (Official event page in Japanese)
•Title: Dynamic Electron-Beam Control Using a GaN-semiconductor Photocathode and Its Application to Semiconductor SEM Analysis
•Speaker: Tomohiro Nishitani (Photo electron Soul Inc.)