The following three of our latest technologies will be presented “SPIE Advanced Lithography + Patterning 2024” in the United States.
SPIE Advanced Lithography + Patterning 2024
Dates: February 26 – 29, 2024
Location: San Jose,California, United States
Our presentations
1. Photoelectron beam from semiconductor photocathodes leading to newinspection technologies
28 February 2024 • 5:30 PM – 7:00 PM PST | Convention Center, Hall 2
2. Local voltage contrast changes in MOSFET using scanning electron microscopy with photoelectron beam technology
28 February 2024 • 5:30 PM – 7:00 PM PST | Convention Center, Hall 2
3.SEM imaging of high aspect ratio trench by selectively controlling the electron beam irradiation using photocathode
28 February 2024 • 5:30 PM – 7:00 PM PST | Convention Center, Hall 2