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GaN-based e-Beam Inspection and Metrology Co-developed by Startup Photo electron Soul Inc. and Nagoya University Will be Evaluated by KIOXIA, a Leading NAND Flash Memory Producer
Our Tech
“Invited Talk at the 12th Symposium of the Advanced Power Semiconductors” An invited talk will be delivered as follows at the 12th Symposium of the Advanced Power Semiconductors.
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Latest progress on “Charge-reduced SEM imaging” will be presented at The 81st Annual Meeting of The Japanese Society of Microscopy.
Our Tech
The following latest technologies will be presented ‘SPIE Advanced Lithography + Patterning’ in the United States.
Our Tech
The following keynote lecture will be presented at 17th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 18th International Conference on Plasma-Nano Technology & Science (ISPlasma2025/IC-PLANTS2025) , to be held in Aichi, Japan.
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The following three of our latest technologies will be presented ‘SPIE Advanced Lithography + Patterning 2024’ in the United States.
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We were published on Semiconductor Engineering website
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