SEMICON JAPAN, Metrology & Inspection Summit 2025
Future-Proofing Tech: Device Innovator, Equipment Giant, and Top
Analysts Aligned!
Date: December 17 (Wed) – 19 (Fri), 2025
Venue: Tokyo Big Sight, Tokyo
Conference Session: Metrology & Inspection x Academia, Beyond 2nm: The
Cutting Edge of Industry-Academia R&D in Japan
Presentation Time: December 18 (Thu), 2025 | 15:30 – 17:00
Title: “GaN-based Laser-Driven E-Beam Redefining Metrology & Inspection,”
Speaker: Tomohiro Nishitani, CTO
Abstract:The GaN-based laser-driven electron beam achieves ultrafast
response and high stability through photoexcitation, establishing a new
principle that surpasses conventional electron sources. This
presentation introduces its applications to non-contact electrical
metrology and high-precision detection of deep-hole bottom structures,
demonstrating its potential to advance next-generation semiconductor
manufacturing and nanoscale device analysis.