The following two of our latest technologies will be presented ‘SPIE Advanced Lithography + Patterning’ in the United States.

The following two of our latest technologies will be presented ‘SPIE Advanced Lithography + Patterning’ in the United States.

Dates: February 26 – March 2, 2023
Location: California, United States

For more information, click here.

Presentation detail
1. Photoelectron beam technology for SEM imaging with pixel-specific control of irradiation beam current
Tomohiro Nishitani, Yuta Arakawa, Shotaro Noda, Atsushi Koizumi, Daiki Sato, Haruka Shikano, Hokuto Iijima, Yoshio Honda, Hiroshi Amano
1 March 2023 • 5:30 PM – 7:00 PM PST | Convention Center, Hall 2

2. Novel electron beam technology by InGaN photocathode for high throughput SEM imaging
Daiki Sato, Atsushi Koizumi, Haruka Shikano, Shotaro Noda, Yohei Otsuka, Daisuke Yasufuku, Kazumasa Mori, Hokuto Iijima, Tomohiro Nishitani, Yoshio Honda, Hiroshi Amano
1 March 2023 • 5:30 PM – 7:00 PM PST | Convention Center, Hall 2